Nov 19, 2020 Asamura Patent Office Receives Once Again a Prestigious IP Award We are pleased to announce that Asamura Patent Office has been awarded Trademark Law Firm of the Year in Japan 2021 by the Corporate Intl Magazine Global Award. Our trademark and design department has been recognised once again for its high –…
Nov 4, 2020 Resumption of Normal Operations We are pleased to announce that our office has resumed normal operations as of November 4, one day earlier than expected. Thank you for understanding and for being patient in the delay of our business operations due to office layout changes. We greatly appreciate your kindness and continued…
Oct 12, 2020 Status of application for design registrations for new subjects of protection under the revised Design Act
Sep 18, 2020 Asamura Patent Office has been included as a Highly Ranked Firm based on MIP Rankings We are delighted to announce that Managing Intellectual Property (MIP) ranked Asamura Patent Office as one of the top IP law firms once again. In IP Stars Firm Rankings our firm ranked Tier 2 for trademark…
Sep 17, 2020 Overview of the Amendments to the Design Law promulgated in May 2019 We are pleased to announce that the English version of the summary of the amendments to the Designs Act promulgated in May 2019 has been published by the JPO. Please click here for further details.
Sep 2, 2020 Our firm once again has successfully ranked in the top 10 recommended IP law firms in Japan in 2020 We are pleased to announce that our firm has ranked in the top 10 recommended IP law firms in Japan during 2020, according to the Patent Lawyer Magazine’s research. With an excellent team…
Sep 2, 2020 Latest Revision of Interview Guidelines for Trademark Examination Trademark Examination Guidelines published by the JPO were revised on August 24, 2020, to facilitate smoother communication between the examiner and the applicant. The main revisions are as follows: 1. Web-based interviews may be conducted via video conferencing system; web application (Skype for Business) will…
